Multi-patterning schemes such as Self-Aligned Double Patterning (SADP) and Self-Aligned Quadruple Patterning (SAQP) have been used to successfully increase semiconductor device density, circumventing ...
A lot has been written and discussed about how to decompose (color) layouts for advanced process nodes that require multipatterning (MP). However, one topic that has been sorely ignored is how to ...
Michael White, director of product marketing, Calibre Physical Verification products, Mentor Graphics At the rate that new technology nodes keep racing by, it sure feels like we’re speeding down the ...
As semiconductor technology advanced from 65nm to 7nm over the last 10 years, new challenges have arisen in design and manufacturing. Securing the IC yield means developing new methods that respond to ...
Multi-patterning enables accurate lithographic resolution at today's most advanced nodes. In this white paper, you will learn about: Why advanced process nodes need multi-patterning What role ...
Lithography scanner light source provider demonstrates capability for the future generation of larger wafers. OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a major lithography light source ...
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